Brion Technologies is a division of ASML and an industry leader in computational lithography for integrated circuits. Brion’s Tachyon™ platform enables capabilities that address chip design, photomask making and wafer printing for semiconductor manufacturing. Brion’s LithoTuner™ platform enables lithography optimization for ASML’s leading photo lithography tools, known as ‘scanners’.
Full chip analysis ensures that every critical
structure is addressed in the matching optimization. Matching is no longer
constrained to simple 1D through-pitch or limited pattern sets. Matching now
finds and optimizes all sensitive patterns through the full process window. For
the first time, matching optimization can cover the full chip over the entire
process window, and with the exact variances of the actual scanners in the fab.
Product Name: Tachyon 2.5
- System Level Design (ESL)
Tachyon 2.5 builds upon the pioneering technology of
Brion’s Tachyon, the industry’s first high-performance, image-based,
dense-simulation computational lithography platform.
Tachyon Focus-Exposure Modeling (FEM) empowers the user
to create a single lithography process model that accurately simulates
focus-exposure lithography variations in the ever-shrinking process window of
today's subwavelength regime.
Built on the ultrafast and scalable Tachyon platform
and enabled by Tachyon's highly accurate, production-proven focus-exposure
modeling (FEM) model, Tachyon OPC+ delivers accurate and efficient
process-window optical proximity correction (OPC), while meeting throughput and
cost of ownership requirements for volume production at the 45nm technology
node and below.
Tachyon RET Design inspection (RDI) and Lithography Manufacturability
Check (LMC) are production-proven full-chip, full process window,
model-based verification tools that deliver the speed and accuracy
to meet the deep subwavelength (or low-k1) photolithography verification
challenge of today and tomorrow.