Brion Technologies

Brion Technologies is a division of ASML and an industry leader in computational lithography for integrated circuits. Brion’s Tachyon™ platform enables capabilities that address chip design, photomask making and wafer printing for semiconductor manufacturing. Brion’s LithoTuner™ platform enables lithography optimization for ASML’s leading photo lithography tools, known as ‘scanners’.

Product Name: LithoTuner™
Product Category: IC Physical Design Tools - ASIC and IC Design

Full chip analysis ensures that every critical structure is addressed in the matching optimization. Matching is no longer constrained to simple 1D through-pitch or limited pattern sets. Matching now finds and optimizes all sensitive patterns through the full process window. For the first time, matching optimization can cover the full chip over the entire process window, and with the exact variances of the actual scanners in the fab.

Product Name: Tachyon 2.5
Product Category: HW/SW Co-Design - System Level Design (ESL)

Tachyon 2.5 builds upon the pioneering technology of Brion’s Tachyon, the industry’s first high-performance, image-based, dense-simulation computational lithography platform.

Product Name: Tachyon™ FEM
Product Category: IC Physical Design Tools - ASIC and IC Design

Tachyon Focus-Exposure Modeling (FEM) empowers the user to create a single lithography process model that accurately simulates focus-exposure lithography variations in the ever-shrinking process window of today's subwavelength regime.

Product Name: Tachyon™ OPC+
Product Category: Design Verification

Built on the ultrafast and scalable Tachyon platform and enabled by Tachyon's highly accurate, production-proven focus-exposure modeling (FEM) model, Tachyon OPC+ delivers accurate and efficient process-window optical proximity correction (OPC), while meeting throughput and cost of ownership requirements for volume production at the 45nm technology node and below.

Product Name: Tachyon™ RDI and LMC
Product Category: Design Verification

Tachyon RET Design inspection (RDI) and Lithography Manufacturability Check (LMC) are production-proven full-chip, full process window, model-based verification tools that deliver the speed and accuracy to meet the deep subwavelength (or low-k1) photolithography verification challenge of today and tomorrow.

4211 Burton Dr.
Santa Clara, CA 95054
United States
Phone: 408-653-1500
Fax: 408-653-1501
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