Photronics is a world leader in sub-wavelength reticle solution technology as a result of its commitment to customer service, value and quality. Established in Connecticut in 1969, the Company became a publicly-held corporation in 1987. Today Photronics operates nine manufacturing facilities around the globe strategically located near the world's leading semiconductor and flat panel display manufacturers.
As the semiconductor industry pushes into extremely low k1 processing, and due to the drastic effects of high MEEF lithography, the feature sizes, resolution and CD control required for aggressive optical proximity correction (OPC) have shrunk below 100nm at mask. Advanced binary masks are available from Photronics high end sites, to support production from 130nm to 65nm technology nodes, and for the quickly ramping 45nm node.
Photronics operates 2 manufacturing facilities in Asia dedicated to production of Large Area Masks, up to Generation 8 size (2200 x 2500mm), using specialized leading-edge laser patterning equipment.
Photronics strongly supports a broad range of mature technology solutions down to 180nm wafer printing for a wide variety of photomask applications. These technologies remain in volume production today. Photronics has built industry leading service strategies to help customers maximize returns while extending their use of incumbent lithography systems.
EAPSM utilizes a wavelength-tuned, 6% transmission MoSiON absorber to produce a 180 degree phase shift. This improves resolution and depth of focus at the wafer lithography tool.